Abstract
Surface terminations critically govern the properties of two-dimensional transition metal carbides and/or nitrides (MXenes), yet a universal strategy to obtain MXenes with uniform and controllable terminations remains elusive. Here we introduce a ‘gas–liquid–solid’ triphasic etching strategy that employs iodine vapour, halide molten salts and MAX phases to produce MXenes with pure and precisely tunable halogen terminations (Cl, Br, I or their combinations). In this process, halide molten salts dissolve iodine via interhalogen anion formation while efficiently transporting etching by-products. The resulting MXenes retain excellent structural integrity, yielding uniformly ordered surfaces. As a representative example, Ti3C2Cl2 shows a 160-fold enhancement in macroscopic conductivity and a 13-fold enhancement in terahertz conductivity relative to conventional Cl/O-terminated Ti3C2, attributed to minimized electron trapping and scattering. Beyond single-halogen terminations, the gas–liquid–solid approach enables dual- and triple-halogen termination control, providing a general platform for tailoring MXene surface chemistry towards advanced (opto)electronic applications.
| Original language | English |
|---|---|
| Journal | Nature Synthesis |
| DOIs | |
| Publication status | E-pub ahead of print - 6 Jan 2026 |
Bibliographical note
Publisher Copyright:© The Author(s) 2026.
Funding
X.F. and M.Y. acknowledge the financial support from European Union’s Horizon 2020 research and innovation programme (GREENCAP 101091572), European Union’s Horizon Europe research and innovation programme (2D-PRINTABLE 101135196, LEAF 101186701), M-ERA.NET and Sächsisches Staatsministerium für Wissenschaft und Kunst (HYSUCAP 100478697) and German Research Foundation (DFG) within the Cluster of Excellence, CRC 1415 (grant no. 417590517) and TRR404 (grant no. DFG 528378584). D.L. acknowledges the support from China Scholarships Council (CSC). P.P.M. acknowledges the support by the National Centre for Research and Development, project number LIDER/8/0055/L-12/20/NCBR/2021. T.Š. acknowledges CzechNanoLab project LM2023051 funded by MEYS CR, TAČR EPSILON project (number TH71020004), GAČR project (number 23-07617 S) for the financial support of experiments at CEITEC Nano Research Infrastructure. We acknowledge the use of the facilities in the Dresden Center for Nanoanalysis (DCN) at Technische Universität Dresden, the GWK support for providing computing time through the Center for Information Services and High-Performance Computing (ZIH) at TU Dresden, and beam time allocation at beamline P65 at the PETRA III synchrotron (DESY, Hamburg, Germany) and beamline BL04 at ALBA synchrotron (Barcelona, Spain). Special thanks to G. Wen (Max Planck Institute for Polymer Research) and S. Voborný (CEITEC) for their suggestions and help.
| Funders | Funder number |
|---|---|
| Central European Institute of Technology | |
| China Scholarship Council | |
| Ministerstvo Školství, Mládeže a Tělovýchovy | |
| Grantová Agentura České Republiky | 23-07617 S |
| Sächsisches Staatsministerium für Wissenschaft und Kunst | HYSUCAP 100478697 |
| Deutsche Forschungsgemeinschaft | TRR404, 417590517, DFG 528378584 |
| European Union’s Horizon Europe research and innovation programme | LEAF 101186701, 2D-PRINTABLE 101135196 |
| Horizon 2020 Framework Programme | GREENCAP 101091572 |
| Technology Agency of the Czech Republic | TH71020004 |
| Narodowe Centrum Badań i Rozwoju | LM2023051, LIDER/8/0055/L-12/20/NCBR/2021 |
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