Thickness dtermination of thin (~ 20nm) microcrystalline silicon Grown by VHF PECVD

A. Gordijn, J. Loffler, W.M. Arnoldbik, F.D. Tichelaar, J.K. Rath, R.E.I. Schropp

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	445-455
Number of pages	11
Journal	Solar Energy Materials and Solar Cells
Volume	87
Publication status	Published - 2005

Cite this

@article{9d0f915649e849e2b2b1ddec1730ffc9,

title = "Thickness dtermination of thin (~ 20nm) microcrystalline silicon Grown by VHF PECVD",

author = "A. Gordijn and J. Loffler and W.M. Arnoldbik and F.D. Tichelaar and J.K. Rath and R.E.I. Schropp",

year = "2005",

language = "Undefined/Unknown",

volume = "87",

pages = "445--455",

journal = "Solar Energy Materials and Solar Cells",

issn = "0927-0248",

publisher = "Elsevier",

}

TY - JOUR

T1 - Thickness dtermination of thin (~ 20nm) microcrystalline silicon Grown by VHF PECVD

AU - Gordijn, A.

AU - Loffler, J.

AU - Arnoldbik, W.M.

AU - Tichelaar, F.D.

AU - Rath, J.K.

AU - Schropp, R.E.I.

PY - 2005

Y1 - 2005

M3 - Article

SN - 0927-0248

VL - 87

SP - 445

EP - 455

JO - Solar Energy Materials and Solar Cells

JF - Solar Energy Materials and Solar Cells

ER -