Thermal annealing of protocrystalline a-Si:H

T.F.G. Muller, C.J. Arendse, S. Halindintwali, D. Knoesen, R.E.I. Schropp

Research output: Contribution to journalArticleAcademicpeer-review

Abstract

It proves difficult to obtain a set of protocrystalline silicon materials with different characteristics from the same deposition chamber to study the exact nature of these transition region materials. Hot-wire deposited protocrystalline silicon was thus isochronically annealed at different temperatures to investigate the bonded hydrogen configurations and structural disorder. Modeling of optical reflection and transmission spectra with Scout® yielded the optical parameters and infrared spectroscopy confirms that bonded hydrogen remains in the material, with the exception of a longer anneal of six hours at 520 °C. Sub bandgap absorption as inferred from photothermal deflection spectroscopy was related to these characteristics.
Original languageEnglish
Pages (from-to)4462-4465
Number of pages4
JournalThin Solid Films
Volume519
Issue number14
DOIs
Publication statusPublished - 2011

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