Thermal annealing of femtosecond laser written structures in silica glass

J.J. Witcher; W.B. Reichman; L.B. Fletcher; N.W. Troy; D.M. Krol

doi:10.1364/OME.3.000502

Thermal annealing of femtosecond laser written structures in silica glass

J.J. Witcher, W.B. Reichman, L.B. Fletcher, N.W. Troy, D.M. Krol

Nanophotonics

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Research output: Contribution to journal › Article › Academic › peer-review

Abstract

We have investigated the thermal stability of femtosecond laser modification inside fused silica. Raman and FL spectroscopy show that fs-laser induced non-bridging oxygen hole center (NBOHC) defects completely disappear at 300 °C, whereas changes in Si-O ring structures only anneal out after heat treatment at 800-900 °C. After annealing at 900 °C optical waveguides written inside the glass had completely disappeared whereas more significant damage induced in the glass remained. The results are related to different types of bond rearrangements in the glass network.

Original language	English
Pages (from-to)	502-510
Number of pages	9
Journal	Optical Materials Express
Volume	4
Issue number	3
DOIs	https://doi.org/10.1364/OME.3.000502
Publication status	Published - 2013

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Ome-3-4-502
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title = "Thermal annealing of femtosecond laser written structures in silica glass",

abstract = "We have investigated the thermal stability of femtosecond laser modification inside fused silica. Raman and FL spectroscopy show that fs-laser induced non-bridging oxygen hole center (NBOHC) defects completely disappear at 300 °C, whereas changes in Si-O ring structures only anneal out after heat treatment at 800-900 °C. After annealing at 900 °C optical waveguides written inside the glass had completely disappeared whereas more significant damage induced in the glass remained. The results are related to different types of bond rearrangements in the glass network.",

author = "J.J. Witcher and W.B. Reichman and L.B. Fletcher and N.W. Troy and D.M. Krol",

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AU - Witcher, J.J.

AU - Reichman, W.B.

AU - Fletcher, L.B.

AU - Troy, N.W.

AU - Krol, D.M.

PY - 2013

Y1 - 2013

N2 - We have investigated the thermal stability of femtosecond laser modification inside fused silica. Raman and FL spectroscopy show that fs-laser induced non-bridging oxygen hole center (NBOHC) defects completely disappear at 300 °C, whereas changes in Si-O ring structures only anneal out after heat treatment at 800-900 °C. After annealing at 900 °C optical waveguides written inside the glass had completely disappeared whereas more significant damage induced in the glass remained. The results are related to different types of bond rearrangements in the glass network.

AB - We have investigated the thermal stability of femtosecond laser modification inside fused silica. Raman and FL spectroscopy show that fs-laser induced non-bridging oxygen hole center (NBOHC) defects completely disappear at 300 °C, whereas changes in Si-O ring structures only anneal out after heat treatment at 800-900 °C. After annealing at 900 °C optical waveguides written inside the glass had completely disappeared whereas more significant damage induced in the glass remained. The results are related to different types of bond rearrangements in the glass network.

U2 - 10.1364/OME.3.000502

DO - 10.1364/OME.3.000502

M3 - Article

SN - 2159-3930

VL - 4

SP - 502

EP - 510

JO - Optical Materials Express

JF - Optical Materials Express

IS - 3

ER -

Thermal annealing of femtosecond laser written structures in silica glass

Abstract

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