The Use of Seed Layers in Hot Wire Chemical Vapor Deposition of Microcrystalline Silicon Films

G.A. Zaharias, A.H. Mahan, R.E.I. Schropp, Y. Xu, D.L. Williamson, M.M. Al-Jassim, M.J. Romero, L.M. Gedvilas

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	A16.5
Number of pages	1
Journal	Materials Research Society symposia proceedings
Volume	715
Publication status	Published - 2002

Cite this

@article{26b53cf6ed0d409a830513b581582a5f,

title = "The Use of Seed Layers in Hot Wire Chemical Vapor Deposition of Microcrystalline Silicon Films",

author = "G.A. Zaharias and A.H. Mahan and R.E.I. Schropp and Y. Xu and D.L. Williamson and M.M. Al-Jassim and M.J. Romero and L.M. Gedvilas",

year = "2002",

language = "Undefined/Unknown",

volume = "715",

pages = "A16.5",

journal = "Materials Research Society symposia proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

}

TY - JOUR

T1 - The Use of Seed Layers in Hot Wire Chemical Vapor Deposition of Microcrystalline Silicon Films

AU - Zaharias, G.A.

AU - Mahan, A.H.

AU - Schropp, R.E.I.

AU - Xu, Y.

AU - Williamson, D.L.

AU - Al-Jassim, M.M.

AU - Romero, M.J.

AU - Gedvilas, L.M.

PY - 2002

Y1 - 2002

M3 - Article

SN - 0272-9172

VL - 715

SP - A16.5

JO - Materials Research Society symposia proceedings

JF - Materials Research Society symposia proceedings

ER -