The role of hydrogen during plasma beam deposition of amorphous thin films

M.C.M. van de Sanden; R.J. Severens; R.F.G. Meulenbroeks; M.J. de Graaf; Z. Qing; D.K. Otorbaev; R. Engeln; J.W.A.M. Gielen; J.A.M. van der Mullen; D.C. Schram

doi:10.1016/0257-8972(95)08356-1

The role of hydrogen during plasma beam deposition of amorphous thin films

M.C.M. van de Sanden
, R.J. Severens
, R.F.G. Meulenbroeks
, M.J. de Graaf
, Z. Qing
, D.K. Otorbaev
, R. Engeln
, J.W.A.M. Gielen
, J.A.M. van der Mullen
, D.C. Schram

Research output: Contribution to journal › Article › Academic › peer-review

Original language	English
Journal	Surface and Coatings Technology
DOIs	https://doi.org/10.1016/0257-8972(95)08356-1
Publication status	Published - 1995

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10.1016/0257-8972(95)08356-1

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@article{fbfd248ed0e146368e726e4b834e529a,

title = "The role of hydrogen during plasma beam deposition of amorphous thin films",

author = "\{van de Sanden\}, M.C.M. and R.J. Severens and R.F.G. Meulenbroeks and \{de Graaf\}, M.J. and Z. Qing and D.K. Otorbaev and R. Engeln and J.W.A.M. Gielen and \{van der Mullen\}, J.A.M. and D.C. Schram",

year = "1995",

doi = "10.1016/0257-8972(95)08356-1",

language = "English",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - The role of hydrogen during plasma beam deposition of amorphous thin films

AU - van de Sanden, M.C.M.

AU - Severens, R.J.

AU - Meulenbroeks, R.F.G.

AU - de Graaf, M.J.

AU - Qing, Z.

AU - Otorbaev, D.K.

AU - Engeln, R.

AU - Gielen, J.W.A.M.

AU - van der Mullen, J.A.M.

AU - Schram, D.C.

PY - 1995

Y1 - 1995

UR - https://www.scopus.com/pages/publications/0029375564

U2 - 10.1016/0257-8972(95)08356-1

DO - 10.1016/0257-8972(95)08356-1

M3 - Article

SN - 0257-8972

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

The role of hydrogen during plasma beam deposition of amorphous thin films

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