The influence of the use of different catalyzers in hot wire CVD for het deposition of polycrystalline silicon thin films

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	53
Number of pages	1
Journal	Diffusion and defect data, solid state data
Volume	80-81
Publication status	Published - 2001

Cite this

@article{cdb27bc9d0014d99b6854f3c4c14017d,

title = "The influence of the use of different catalyzers in hot wire CVD for het deposition of polycrystalline silicon thin films",

author = "{van Veenendaal}, P.A.T.T. and J.K. Rath and O.L.J. Gijzeman and R.E.I. Schropp",

year = "2001",

language = "Undefined/Unknown",

volume = "80-81",

pages = "53",

journal = "Diffusion and defect data, solid state data",

issn = "1012-0394",

publisher = "Scientific.net",

}

TY - JOUR

T1 - The influence of the use of different catalyzers in hot wire CVD for het deposition of polycrystalline silicon thin films

AU - van Veenendaal, P.A.T.T.

AU - Rath, J.K.

AU - Gijzeman, O.L.J.

AU - Schropp, R.E.I.

PY - 2001

Y1 - 2001

M3 - Article

SN - 1012-0394

VL - 80-81

SP - 53

JO - Diffusion and defect data, solid state data

JF - Diffusion and defect data, solid state data

ER -