The influence of different catalyzers in hot wire CVD for the deposition of polycrystalline silicon thin films

P.A.T.T. van Veenendaal, O.L.J. Gijzeman, J.K. Rath, R.E.I. Schropp

Research output: Contribution to journal › Article › Academic › peer-review

Cite this

@article{4328a6fc76d1431a8dc110eb8238fdcd,

title = "The influence of different catalyzers in hot wire CVD for the deposition of polycrystalline silicon thin films",

author = "{van Veenendaal}, P.A.T.T. and O.L.J. Gijzeman and J.K. Rath and R.E.I. Schropp",

year = "2001",

language = "Undefined/Unknown",

volume = "395",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier BV",

}