Study of the a-Si/a-SiO2 interface deposited by r.f. magnetron sputtering

N. Tomozeiu, E.E.H. van Faassen, A. Palmero Acebedo, W.M. Arnoldbik, A.M. Vredenberg, F.H.P.M. Habraken

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@article{29cc17fbf3a34fc39d7ed2596c2ba467,

title = "Study of the a-Si/a-SiO2 interface deposited by r.f. magnetron sputtering",

author = "N. Tomozeiu and {van Faassen}, E.E.H. and {Palmero Acebedo}, A. and W.M. Arnoldbik and A.M. Vredenberg and F.H.P.M. Habraken",

year = "2004",

language = "Undefined/Unknown",

volume = "447",

pages = "306--310",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

number = "448",

}