Structural properties of a-SiOx layers deposited by reactive sputtering technique

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@article{38181253644546bca47ab06d46f8fedc,

title = "Structural properties of a-SiOx layers deposited by reactive sputtering technique",

author = "N. Tomozeiu and \{van Hapert\}, J.J. and \{van Faassen\}, E.E.H. and \{Arnold Bik\}, W.M. and A.M. Vredenberg and F.H.P.M. Habraken",

year = "2002",

language = "Undefined/Unknown",

volume = "4",

pages = "513--521",

journal = "j. optoel. adv. mat",

number = "3",

}