Structural properties of a-SiOx layers deposited by reactive sputtering technique

N. Tomozeiu, J.J. van Hapert, E.E.H. van Faassen, W.M. Arnold Bik, A.M. Vredenberg, F.H.P.M. Habraken

Research output: Contribution to journal › Article › Academic › peer-review

Cite this

@article{38181253644546bca47ab06d46f8fedc,

title = "Structural properties of a-SiOx layers deposited by reactive sputtering technique",

author = "N. Tomozeiu and {van Hapert}, J.J. and {van Faassen}, E.E.H. and {Arnold Bik}, W.M. and A.M. Vredenberg and F.H.P.M. Habraken",

year = "2002",

language = "Undefined/Unknown",

volume = "4",

pages = "513--521",

journal = "j. optoel. adv. mat",

number = "3",

}