| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 1062-1064 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 69 |
| Issue number | 8 |
| Publication status | Published - 1996 |
Stability of hot-wire deposited amorphous-silicon thin-film transistors
- H. Meiling
- , R.E.I. Schropp
Research output: Contribution to journal › Article › Academic › peer-review