Stability of hot-wire deposited amorphous-silicon thin-film transistors

H. Meiling, R.E.I. Schropp

Research output: Contribution to journal › Article › Academic › peer-review

Cite this

@article{6ac2148681a44452ae0793a76239f8c3,

title = "Stability of hot-wire deposited amorphous-silicon thin-film transistors",

author = "H. Meiling and R.E.I. Schropp",

year = "1996",

language = "Undefined/Unknown",

volume = "69",

pages = "1062--1064",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "8",

}