Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer

C.H.M. van der Werf; H.D. Goldbach; J. Loffler; a. Scarfo; A.M.C. Kylner; B. Stannowski; W.M. Arnoldbik; A.W. Weeber; H. Rieffe; W.J.J. Soppe; J.K. Rath; R.E.I. Schropp

Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer

C.H.M. van der Werf, H.D. Goldbach, J. Loffler, a. Scarfo, A.M.C. Kylner, B. Stannowski, W.M. Arnoldbik, A.W. Weeber, H. Rieffe, W.J.J. Soppe, J.K. Rath, R.E.I. Schropp

extern

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Journal	Thin Solid Films
Publication status	Published - 2005

Bibliographical note

online 11-8-2005

Cite this

@article{c066006a75ff4fc294ffd78fc38e614d,

title = "Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer",

author = "{van der Werf}, C.H.M. and H.D. Goldbach and J. Loffler and a. Scarfo and A.M.C. Kylner and B. Stannowski and W.M. Arnoldbik and A.W. Weeber and H. Rieffe and W.J.J. Soppe and J.K. Rath and R.E.I. Schropp",

note = "online 11-8-2005",

year = "2005",

language = "Undefined/Unknown",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer

AU - van der Werf, C.H.M.

AU - Goldbach, H.D.

AU - Loffler, J.

AU - Scarfo, a.

AU - Kylner, A.M.C.

AU - Stannowski, B.

AU - Arnoldbik, W.M.

AU - Weeber, A.W.

AU - Rieffe, H.

AU - Soppe, W.J.J.

AU - Rath, J.K.

AU - Schropp, R.E.I.

N1 - online 11-8-2005

PY - 2005

Y1 - 2005

M3 - Article

SN - 0040-6090

JO - Thin Solid Films

JF - Thin Solid Films

ER -