Original language | Undefined/Unknown |
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Pages (from-to) | 51-54 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 501 |
Publication status | Published - 2006 |
silicon nitride at high deposition rate by hot-wire chemical vapour deposition as passivating andantirefelection layer on multicrystalline silicon solar cells
C.H.M. van der Werf, H.D. Goldbach, J. Loffler, a. Scarfo, A.M.C. Kylner, B. Stannowski, W.M. Arnoldbik, A.W. Weeber, H. Rieffe, B.J. Soppe, J.K. Rath, R.E.I. Schropp
Research output: Contribution to journal › Meeting Abstract › Other research output