Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOx by Chemical Vapor Deposition

Jinbo Pang, Rafael G. Mendes, Pawel S. Wrobel, Michal D. Wlodarski, Huy Quang Ta, Liang Zhao, Lars Giebeler, Barbara Trzebicka, Thomas Gemming, Lei Fu, Zhongfan Liu, Juergen Eckert, Alicja Bachmatiuk, Mark H. Rümmeli

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