Postdeposition thermal annealing studies of microcrystalline si:h deposited at ultra low temperature

P.C.P. Bronsveld, H.J. van der Wagt, J.K. Rath, R.E.I. Schropp, W. Beyer

Research output: Contribution to journal › Meeting Abstract › Other research output

Cite this

@article{50264a7ad90e41b0bd39aba993b6e9d9,

title = "Postdeposition thermal annealing studies of microcrystalline si:h deposited at ultra low temperature",

author = "P.C.P. Bronsveld and {van der Wagt}, H.J. and J.K. Rath and R.E.I. Schropp and W. Beyer",

year = "2006",

language = "Undefined/Unknown",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}