Original language | Undefined/Unknown |
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Pages (from-to) | 609-611 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 75 |
Issue number | 5 |
Publication status | Published - 1999 |
Positive ions as growth precursors in plasma enhanced chemical vapor deposition of hydrogenated amorphous silicon
E.A.G. Hamers, J. Bezemer, W. van der Weg
Research output: Contribution to journal › Article › Academic › peer-review