Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma

M.C.M. Van De Sanden, R.J. Severens, W.M.M. Kessels, R.F.G. Meulenbroeks, D.C. Schram

Research output: Contribution to journal › Article › Academic › peer-review

Access to Document

@article{bb64b226ca4348e7a543182d0fae59ee,

title = "Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma",

author = "{Van De Sanden}, M.C.M. and R.J. Severens and W.M.M. Kessels and R.F.G. Meulenbroeks and D.C. Schram",

year = "1998",

doi = "10.1063/1.368977",

language = "Undefined/Unknown",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

}

TY - JOUR

T1 - Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma

AU - Van De Sanden, M.C.M.

AU - Severens, R.J.

AU - Kessels, W.M.M.

AU - Meulenbroeks, R.F.G.

AU - Schram, D.C.

PY - 1998

Y1 - 1998

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-0001019934&partnerID=MN8TOARS

U2 - 10.1063/1.368977

DO - 10.1063/1.368977

M3 - Article

SN - 0021-8979

JO - Journal of Applied Physics

JF - Journal of Applied Physics

ER -