Photoelectrochemistry and Etching of SiC: a Comparison with Si

J.J. Kelly, D.H. van Dorp, J.L. Weyher

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The anodic electrochemistry and etching of the group IV compound semiconductor SiC was studied in both KOH and acidic fluoride solutions. The results for p-type and n-type electrodes are compared with those obtained for the group IV elemental semiconductor Si. We point out a number of interesting applications of this work for SiC device technology.
Original languageUndefined/Unknown
Pages (from-to)513-524
Number of pages15
JournalECS Transactions
Issue number2
Publication statusPublished - 2007

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