On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar-O2 mixtures: theoretical and experimental approach

A. Palmero Acebedo; N. Tomozeiu; A.M. Vredenberg; W.M. Arnoldbik; F.H.P.M. Habraken

On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar-O2 mixtures: theoretical and experimental approach

A. Palmero Acebedo
, N. Tomozeiu
, A.M. Vredenberg
, W.M. Arnoldbik
, F.H.P.M. Habraken

extern

Research output: Contribution to journal › Article › Academic › peer-review

Original language	English
Pages (from-to)	214-221
Number of pages	8
Journal	Surface & coatings technology
Volume	177-178
Publication status	Published - 2004

Cite this

@article{da69b08c39a64efc98f2dbf99f9ad4f6,

title = "On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar-O2 mixtures: theoretical and experimental approach",

author = "\{Palmero Acebedo\}, A. and N. Tomozeiu and A.M. Vredenberg and W.M. Arnoldbik and F.H.P.M. Habraken",

year = "2004",

language = "English",

volume = "177-178",

pages = "214--221",

journal = "Surface \& coatings technology",

issn = "0257-8972",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - On the deposition process of silicon suboxides by a RF magnetron reactive sputtering in Ar-O2 mixtures: theoretical and experimental approach

AU - Palmero Acebedo, A.

AU - Tomozeiu, N.

AU - Vredenberg, A.M.

AU - Arnoldbik, W.M.

AU - Habraken, F.H.P.M.

PY - 2004

Y1 - 2004

M3 - Article

SN - 0257-8972

VL - 177-178

SP - 214

EP - 221

JO - Surface & coatings technology

JF - Surface & coatings technology

ER -