On expanding recombining plasma for fast deposition of a-Si:H thin films

G.J. Meeusen, R.P. Dahiya, M.C.M. Van De Sanden, G. Dinescu, Z. Qing, R.F.G. Meulenbroeks, D.C. Schram

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Journal	Plasma Sources Science and Technology
DOIs	https://doi.org/10.1088/0963-0252/3/4/009
Publication status	Published - 1994

Access to Document

@article{6983a7cd2b6e498dade55eb4471380de,

title = "On expanding recombining plasma for fast deposition of a-Si:H thin films",

author = "G.J. Meeusen and R.P. Dahiya and {Van De Sanden}, M.C.M. and G. Dinescu and Z. Qing and R.F.G. Meulenbroeks and D.C. Schram",

year = "1994",

doi = "10.1088/0963-0252/3/4/009",

language = "Undefined/Unknown",

journal = "Plasma Sources Science and Technology",

issn = "0963-0252",

publisher = "IOP PUBLISHING LTD",

}

TY - JOUR

T1 - On expanding recombining plasma for fast deposition of a-Si:H thin films

AU - Meeusen, G.J.

AU - Dahiya, R.P.

AU - Van De Sanden, M.C.M.

AU - Dinescu, G.

AU - Qing, Z.

AU - Meulenbroeks, R.F.G.

AU - Schram, D.C.

PY - 1994

Y1 - 1994

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-0042188744&partnerID=MN8TOARS

U2 - 10.1088/0963-0252/3/4/009

DO - 10.1088/0963-0252/3/4/009

M3 - Article

SN - 0963-0252

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

ER -