Modifications in thin film structures by swift heavy ions

W.M. Arnoldbik; N. Tomozeiu; F.H.P.M. Habraken

doi:10.1016/j.vacuum.2003.12.034

Modifications in thin film structures by swift heavy ions

W.M. Arnoldbik, N. Tomozeiu, F.H.P.M. Habraken

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Research output: Contribution to journal › Article › Academic › peer-review

Abstract

We review older and more recent work concerning modification of thin films during irradiation with heavy ions in the electronic energy deposition regime: loss of H2 and N2 from the bulk of several thin film materials, electronic sputtering of SiO2 and oxygen diffusion across an interface in SiO2.

Original language	Undefined/Unknown
Pages (from-to)	109-114
Number of pages	6
Journal	Vacuum
Volume	73
Issue number	1
DOIs	https://doi.org/10.1016/j.vacuum.2003.12.034
Publication status	Published - 8 Mar 2004

Keywords

Ion beams
Irradiation damage
Ion tracks
Permeability
Hydrogen desorption
Oxygen desorption
Electronic sputtering
Silicon dioxide
Elastic recoil detection analysis

Access to Document

10.1016/j.vacuum.2003.12.034

Cite this

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title = "Modifications in thin film structures by swift heavy ions",

abstract = "We review older and more recent work concerning modification of thin films during irradiation with heavy ions in the electronic energy deposition regime: loss of H2 and N2 from the bulk of several thin film materials, electronic sputtering of SiO2 and oxygen diffusion across an interface in SiO2.",

keywords = "Ion beams, Irradiation damage, Ion tracks, Permeability, Hydrogen desorption, Oxygen desorption, Electronic sputtering, Silicon dioxide, Elastic recoil detection analysis",

author = "W.M. Arnoldbik and N. Tomozeiu and F.H.P.M. Habraken",

year = "2004",

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T1 - Modifications in thin film structures by swift heavy ions

AU - Arnoldbik, W.M.

AU - Tomozeiu, N.

AU - Habraken, F.H.P.M.

PY - 2004/3/8

Y1 - 2004/3/8

N2 - We review older and more recent work concerning modification of thin films during irradiation with heavy ions in the electronic energy deposition regime: loss of H2 and N2 from the bulk of several thin film materials, electronic sputtering of SiO2 and oxygen diffusion across an interface in SiO2.

AB - We review older and more recent work concerning modification of thin films during irradiation with heavy ions in the electronic energy deposition regime: loss of H2 and N2 from the bulk of several thin film materials, electronic sputtering of SiO2 and oxygen diffusion across an interface in SiO2.

KW - Ion beams

KW - Irradiation damage

KW - Ion tracks

KW - Permeability

KW - Hydrogen desorption

KW - Oxygen desorption

KW - Electronic sputtering

KW - Silicon dioxide

KW - Elastic recoil detection analysis

U2 - 10.1016/j.vacuum.2003.12.034

DO - 10.1016/j.vacuum.2003.12.034

M3 - Article

SN - 1879-2715

VL - 73

SP - 109

EP - 114

JO - Vacuum

JF - Vacuum

IS - 1

ER -