| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 491-496 |
| Number of pages | 6 |
| Journal | Journal of Applied Crystallography |
| Volume | 35 |
| Publication status | Published - 2002 |
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Modeling growth and equilibrium form of alpha-SiO2
- M.F. Nicolov
- , C.F. Woensdregt
- extern
Research output: Contribution to journal › Article › Academic › peer-review