Ion beam iduced desorption from thin films: SiO2 single layers and SiO2/Si multilayers

A. Bik, W.M. Tomozeiu, F.H.P.M. Habraken

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	433-438
Number of pages	6
Journal	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Volume	190
Publication status	Published - 2002

Cite this

@article{9f74b9b4282942c2b5775c42e90b5554,

title = "Ion beam iduced desorption from thin films: SiO2 single layers and SiO2/Si multilayers",

author = "A. Bik and W.M. Tomozeiu and F.H.P.M. Habraken",

year = "2002",

language = "Undefined/Unknown",

volume = "190",

pages = "433--438",

journal = "Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - Ion beam iduced desorption from thin films: SiO2 single layers and SiO2/Si multilayers

AU - Bik, A.

AU - Tomozeiu, W.M.

AU - Habraken, F.H.P.M.

PY - 2002

Y1 - 2002

M3 - Article

SN - 0168-583X

VL - 190

SP - 433

EP - 438

JO - Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

ER -