Internal structure of mixed phase hydrogenated silicon thin films made at 39 C

P.C.P. Bronsveld, T. Mates, A. Fejfar, B. Rezek, J. Kocka, J.K. Rath, R.E.I. Schropp

Research output: Contribution to journal › Meeting Abstract › Other research output

Cite this

@article{27935a33efbd48e1b5023eaa1ca93ef1,

title = "Internal structure of mixed phase hydrogenated silicon thin films made at 39 C",

author = "P.C.P. Bronsveld and T. Mates and A. Fejfar and B. Rezek and J. Kocka and J.K. Rath and R.E.I. Schropp",

year = "2006",

language = "Undefined/Unknown",

volume = "89",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "051922",

}