Integrated diffusion-recombination model for describing the logarithmic time dependence of plasma damage in porous low-k materials

Keyphrases

• Damage Depth 33%
• Dominant Role 33%
• Extended Model 33%
• Logarithmic Equation 33%
• Low Depth 33%
• One-dimensional Random Walk 33%
• Oxygen Atom 33%
• Oxygen Plasma 33%
• Plasma-induced Damage 100%
• Polylogarithmic Time 100%
• Porous Low-k Material 100%
• Radical Concentration 33%
• Random Walk Theory 33%
• Recombination 100%
• Recombination Model 100%
• Theory Calculation 33%
• Time Dependence 100%
• UV Light 33%

Engineering

• Function of Time 50%
• Induced Damage 50%
• Logarithmic Equation 50%
• One Dimensional 50%
• Oxygen Atom 50%
• Plasma Damage 100%
• Porosity 100%