Influence of Pressure and Plasma Potential on High Growth Rate Microcrystalline silicon Grown by VHF PECVD

A. Gordijn, A.L. Francke, L. Hodakova, J.K. Rath, R.E.I. Schropp

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Journal	Materials Research Society symposia proceedings
Volume	862
Issue number	A 10.3
Publication status	Published - 2005

Cite this

@article{9e95d8db652e457f9eb132f87557cfa4,

title = "Influence of Pressure and Plasma Potential on High Growth Rate Microcrystalline silicon Grown by VHF PECVD",

author = "A. Gordijn and A.L. Francke and L. Hodakova and J.K. Rath and R.E.I. Schropp",

year = "2005",

language = "Undefined/Unknown",

volume = "862",

journal = "Materials Research Society symposia proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

number = "A 10.3",

}

TY - JOUR

T1 - Influence of Pressure and Plasma Potential on High Growth Rate Microcrystalline silicon Grown by VHF PECVD

AU - Gordijn, A.

AU - Francke, A.L.

AU - Hodakova, L.

AU - Rath, J.K.

AU - Schropp, R.E.I.

PY - 2005

Y1 - 2005

M3 - Article

SN - 0272-9172

VL - 862

JO - Materials Research Society symposia proceedings

JF - Materials Research Society symposia proceedings

IS - A 10.3

ER -