Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma-enhanced chemical vapour desposition

A. Gordijn; M. Vanecek; W.J. Goedheer; J.K. Rath; R.E.I. Schropp

Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma-enhanced chemical vapour desposition

A. Gordijn, M. Vanecek, W.J. Goedheer, J.K. Rath, R.E.I. Schropp

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Research output: Contribution to journal › Meeting Abstract › Other research output

Original language	Undefined/Unknown
Pages (from-to)	6166-6172
Number of pages	7
Journal	Tijdschrift: tijdelijk onbekend
Volume	45(8A)
Publication status	Published - 2006

Cite this

@article{3d1a4942d3fd452ba3d45d1f0b92b25d,

title = "Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma-enhanced chemical vapour desposition",

author = "A. Gordijn and M. Vanecek and W.J. Goedheer and J.K. Rath and R.E.I. Schropp",

year = "2006",

language = "Undefined/Unknown",

volume = "45(8A)",

pages = "6166--6172",

journal = "Tijdschrift: tijdelijk onbekend",

}

TY - JOUR

T1 - Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by very high frequency plasma-enhanced chemical vapour desposition

AU - Gordijn, A.

AU - Vanecek, M.

AU - Goedheer, W.J.

AU - Rath, J.K.

AU - Schropp, R.E.I.

PY - 2006

Y1 - 2006

M3 - Meeting Abstract

VL - 45(8A)

SP - 6166

EP - 6172

JO - Tijdschrift: tijdelijk onbekend

JF - Tijdschrift: tijdelijk onbekend

ER -