High-energy ion-beam-induced phase separation in SiOx films

W.M. Arnoldbik, N. Tomozeiu, E.D. van Hattum, R.W. Lof, A.M. Vredenberg

Research output: Contribution to journal › Article › Academic › peer-review

Original language	English
Pages (from-to)	125329
Number of pages	7
Journal	Physical review. B, Condensed matter and materials physics
Volume	71
Issue number	12
Publication status	Published - 2005

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title = "High-energy ion-beam-induced phase separation in SiOx films",

author = "W.M. Arnoldbik and N. Tomozeiu and {van Hattum}, E.D. and R.W. Lof and A.M. Vredenberg",

year = "2005",

language = "English",

volume = "71",

pages = "125329",

journal = "Physical review. B, Condensed matter and materials physics",

issn = "1098-0121",

publisher = "American Physical Society",

number = "12",

}

TY - JOUR

T1 - High-energy ion-beam-induced phase separation in SiOx films

AU - Arnoldbik, W.M.

AU - Tomozeiu, N.

AU - van Hattum, E.D.

AU - Lof, R.W.

AU - Vredenberg, A.M.

PY - 2005

Y1 - 2005

M3 - Article

SN - 1098-0121

VL - 71

SP - 125329

JO - Physical review. B, Condensed matter and materials physics

JF - Physical review. B, Condensed matter and materials physics

IS - 12

ER -