High deposition rate a-Si:H through VHF-CVD of argon-diluted silane

H. Meiling, J. Bezemer, R.E.I. Schropp, W. van der Weg

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	459-470
Number of pages	12
Journal	Materials Research Society symposia proceedings
Volume	467
Publication status	Published - 1997

Cite this

@article{0e6836c348ed49adbb72fef334d9d2aa,

title = "High deposition rate a-Si:H through VHF-CVD of argon-diluted silane",

author = "H. Meiling and J. Bezemer and R.E.I. Schropp and {van der Weg}, W.",

year = "1997",

language = "Undefined/Unknown",

volume = "467",

pages = "459--470",

journal = "Materials Research Society symposia proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

}