TY - JOUR
T1 - Fabrication and characterization of nanorod solar cells with an ultrathin a-Si:H absorber layer
AU - Kuang, Y.
AU - van der Werf, C.H.M.
AU - Houweling, Z.S.
AU - Di Vece, M.
AU - Schropp, R.E.I.
PY - 2011
Y1 - 2011
N2 - In this paper, we present a three-dimensional nanorod solar cell design. As the backbone of the nanorod device,
density-controlled zinc oxide (ZnO) nanorods were synthesized by a simple aqueous solution growth
technique at 80 °C on ZnO thin film pre-coated glass substrate. The as-prepared ZnO nanorods were coated
by an amorphous hydrogenated silicon (a-Si:H) light absorber layer to form a nanorod solar cell. The light
management, current–voltage characteristics and corresponding external quantum efficiency of the solar
cells were investigated. An energy conversion efficiency of 3.9% was achieved for the nanorod solar cells
with an a-Si:H absorber layer thickness of 75 nm, which is significantly higher than the 2.6% and the 3.0%
obtained for cells with the same a-Si:H absorber layer thickness on planar ZnO and on textured SnO2:F
counterparts, respectively. A short-circuit current density of 11.6 mA/cm2 and correspondingly, a broad external
quantum efficiency profile were achieved for the nanorod device. An absorbed light fraction higher
than 80% in the wavelength range of 375–675 nm was also demonstrated for the nanorod solar cells, including
a peak value of ~90% at 520–530 nm.
AB - In this paper, we present a three-dimensional nanorod solar cell design. As the backbone of the nanorod device,
density-controlled zinc oxide (ZnO) nanorods were synthesized by a simple aqueous solution growth
technique at 80 °C on ZnO thin film pre-coated glass substrate. The as-prepared ZnO nanorods were coated
by an amorphous hydrogenated silicon (a-Si:H) light absorber layer to form a nanorod solar cell. The light
management, current–voltage characteristics and corresponding external quantum efficiency of the solar
cells were investigated. An energy conversion efficiency of 3.9% was achieved for the nanorod solar cells
with an a-Si:H absorber layer thickness of 75 nm, which is significantly higher than the 2.6% and the 3.0%
obtained for cells with the same a-Si:H absorber layer thickness on planar ZnO and on textured SnO2:F
counterparts, respectively. A short-circuit current density of 11.6 mA/cm2 and correspondingly, a broad external
quantum efficiency profile were achieved for the nanorod device. An absorbed light fraction higher
than 80% in the wavelength range of 375–675 nm was also demonstrated for the nanorod solar cells, including
a peak value of ~90% at 520–530 nm.
U2 - 10.1016/j.jnoncrysol.2011.11.021
DO - 10.1016/j.jnoncrysol.2011.11.021
M3 - Article
SN - 0022-3093
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
ER -