Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]

W. G. J. H. M. van Sark; G. J. H. M. Janssen; M. H. J. M. de Croon; X. Tang; L. J. Giling; W. M. Arnold Bik; C. P. M. Dunselman; F. H. P. M. Habraken; W. F. van der Weg

doi:10.1063/1.344505

Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]

W. G. J. H. M. van Sark
, G. J. H. M. Janssen
, M. H. J. M. de Croon
, X. Tang
, L. J. Giling
, W. M. Arnold Bik
, C. P. M. Dunselman
, F. H. P. M. Habraken
, W. F. van der Weg

Energy and Resources

Research output: Contribution to journal › Article › Academic › peer-review

Abstract

Not Available

Original language	English
Pages (from-to)	6199
Journal	Journal of Applied Physics
Volume	66
DOIs	https://doi.org/10.1063/1.344505
Publication status	Published - 1 Dec 1989

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10.1063/1.344505

http://adsabs.harvard.edu/abs/1989JAP....66.6199V

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van Sark, W. G. J. H. M., Janssen, G. J. H. M., de Croon, M. H. J. M., Tang, X., Giling, L. J., Bik, W. M. A., Dunselman, C. P. M., Habraken, F. H. P. M., & van der Weg, W. F. (1989). Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]. Journal of Applied Physics, 66, 6199. https://doi.org/10.1063/1.344505

@article{058baeb38de3404baa9d903fe843f9ca,

title = "Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]",

abstract = "Not Available",

author = "\{van Sark\}, \{W. G. J. H. M.\} and Janssen, \{G. J. H. M.\} and \{de Croon\}, \{M. H. J. M.\} and X. Tang and Giling, \{L. J.\} and Bik, \{W. M. Arnold\} and Dunselman, \{C. P. M.\} and Habraken, \{F. H. P. M.\} and \{van der Weg\}, \{W. F.\}",

year = "1989",

month = dec,

day = "1",

doi = "10.1063/1.344505",

language = "English",

volume = "66",

pages = "6199",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

}

van Sark, WGJHM, Janssen, GJHM, de Croon, MHJM, Tang, X, Giling, LJ, Bik, WMA, Dunselman, CPM, Habraken, FHPM & van der Weg, WF 1989, 'Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]', Journal of Applied Physics, vol. 66, pp. 6199. https://doi.org/10.1063/1.344505

Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]. / van Sark, W. G. J. H. M.; Janssen, G. J. H. M.; de Croon, M. H. J. M. et al.
In: Journal of Applied Physics, Vol. 66, 01.12.1989, p. 6199.

Research output: Contribution to journal › Article › Academic › peer-review

TY - JOUR

T1 - Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]

AU - van Sark, W. G. J. H. M.

AU - Janssen, G. J. H. M.

AU - de Croon, M. H. J. M.

AU - Tang, X.

AU - Giling, L. J.

AU - Bik, W. M. Arnold

AU - Dunselman, C. P. M.

AU - Habraken, F. H. P. M.

AU - van der Weg, W. F.

PY - 1989/12/1

Y1 - 1989/12/1

N2 - Not Available

AB - Not Available

U2 - 10.1063/1.344505

DO - 10.1063/1.344505

M3 - Article

SN - 0021-8979

VL - 66

SP - 6199

JO - Journal of Applied Physics

JF - Journal of Applied Physics

ER -

Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]

Abstract

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