Erratum: ``Temperature-dependent aluminum incorporation in AlxGa1 - xAs layers grown by metalorganic vapor phase epitaxy'' [J. Appl. Phys. 64, 195 (1988)]

W. G. J. H. M. van Sark, G. J. H. M. Janssen, M. H. J. M. de Croon, X. Tang, L. J. Giling, W. M. Arnold Bik, C. P. M. Dunselman, F. H. P. M. Habraken, W. F. van der Weg

Research output: Contribution to journalArticleAcademicpeer-review

Abstract

Not Available
Original languageEnglish
Pages (from-to)6199
JournalJournal of Applied Physics
Volume66
DOIs
Publication statusPublished - 1 Dec 1989

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