Epitaxial thickening by hot wire chemical vapour deposition of polycrystalline silicon seed layers on glass

J. Stradal; G. Scholma; H. Li; C.H.M. van der Werf; J.K. Rath; P.I. Widenborg; P. Campbell; A.G. Aberle; R.E.I. Schropp

Epitaxial thickening by hot wire chemical vapour deposition of polycrystalline silicon seed layers on glass

J. Stradal, G. Scholma, H. Li, C.H.M. van der Werf, J.K. Rath, P.I. Widenborg, P. Campbell, A.G. Aberle, R.E.I. Schropp

extern

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Journal	Thin Solid Films
Publication status	Published - 2005

Bibliographical note

online 19 aug 2005

Cite this

@article{a9e740537195452d8b3e3ab1456e96dd,

title = "Epitaxial thickening by hot wire chemical vapour deposition of polycrystalline silicon seed layers on glass",

author = "J. Stradal and G. Scholma and H. Li and {van der Werf}, C.H.M. and J.K. Rath and P.I. Widenborg and P. Campbell and A.G. Aberle and R.E.I. Schropp",

note = "online 19 aug 2005",

year = "2005",

language = "Undefined/Unknown",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - Epitaxial thickening by hot wire chemical vapour deposition of polycrystalline silicon seed layers on glass

AU - Stradal, J.

AU - Scholma, G.

AU - Li, H.

AU - van der Werf, C.H.M.

AU - Rath, J.K.

AU - Widenborg, P.I.

AU - Campbell, P.

AU - Aberle, A.G.

AU - Schropp, R.E.I.

N1 - online 19 aug 2005

PY - 2005

Y1 - 2005

M3 - Article

SN - 0040-6090

JO - Thin Solid Films

JF - Thin Solid Films

ER -