Epitaxial thickening by hot wire chemical vapor deposition of polycrystalline silicon seed layers on glas

J. Stradal; G. Scholma; H. B. T. Li; C.H.M. van der Werf; J.K. Rath; P.I. Widenborg; P. Campbell; A.G. Aberle; R.E.I. Schropp

Epitaxial thickening by hot wire chemical vapor deposition of polycrystalline silicon seed layers on glas

J. Stradal, G. Scholma, H. B. T. Li, C.H.M. van der Werf, J.K. Rath, P.I. Widenborg, P. Campbell, A.G. Aberle, R.E.I. Schropp

extern

Research output: Contribution to journal › Meeting Abstract › Other research output

Original language	Undefined/Unknown
Pages (from-to)	335-337
Number of pages	3
Journal	Thin Solid Films
Volume	501
Publication status	Published - 2006

Cite this

@article{8f0a31f508b543e0b03f044122a9cb5a,

title = "Epitaxial thickening by hot wire chemical vapor deposition of polycrystalline silicon seed layers on glas",

author = "J. Stradal and G. Scholma and Li, {H. B. T.} and {van der Werf}, C.H.M. and J.K. Rath and P.I. Widenborg and P. Campbell and A.G. Aberle and R.E.I. Schropp",

year = "2006",

language = "Undefined/Unknown",

volume = "501",

pages = "335--337",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier BV",

}

TY - JOUR

T1 - Epitaxial thickening by hot wire chemical vapor deposition of polycrystalline silicon seed layers on glas

AU - Stradal, J.

AU - Scholma, G.

AU - Li, H. B. T.

AU - van der Werf, C.H.M.

AU - Rath, J.K.

AU - Widenborg, P.I.

AU - Campbell, P.

AU - Aberle, A.G.

AU - Schropp, R.E.I.

PY - 2006

Y1 - 2006

M3 - Meeting Abstract

SN - 0040-6090

VL - 501

SP - 335

EP - 337

JO - Thin Solid Films

JF - Thin Solid Films

ER -