Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amourphous silicon films

K.F. Feenstra, P.F.A. Alkemade, E. Algra, R.E.I. Schropp, W. van der Weg

Research output: Contribution to journalArticleAcademicpeer-review

Original languageUndefined/Unknown
Pages (from-to)341-351
Number of pages11
JournalProgress in photovoltaics
Volume7
Issue number5
Publication statusPublished - 1999

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