Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapor deposition

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	309-321
Number of pages	13
Journal	Philosophical Magazine Letters
Volume	76
Issue number	3
Publication status	Published - 1997

Cite this

@article{44178292cfda4d56be410ec1b3f5eed2,

title = "Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapor deposition",

author = "R.E.I. Schropp and K.F. Feenstra and E.C. Molenbroek and H. Meiling and J.K. Rath",

year = "1997",

language = "Undefined/Unknown",

volume = "76",

pages = "309--321",

journal = "Philosophical Magazine Letters",

issn = "0950-0839",

publisher = "Taylor and Francis",

number = "3",

}