Deposition-rate reduction through improper substrate-to-electrode attachment in very-high-frequency deposition of a-Si:H

H. Meiling, W. G. J. H. M. van Sark, J. Bezemer, W. F. van der Weg

Research output: Contribution to journal › Article › Academic › peer-review

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Material Science

Engineering

Physics

Biochemistry, Genetics and Molecular Biology

Chemical Engineering