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Deposition of device quality amorphous silicon by hot-wire CVD

  • K.F. Feenstra
  • , C.H.M. van der Werf
  • , E.C. Molenbroek
  • , R.E.I. Schropp
  • extern

Research output: Contribution to journalArticleAcademicpeer-review

Original languageUndefined/Unknown
Pages (from-to)645-650
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume467
Publication statusPublished - 1997

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