Deposition of device quality amorphous silicon by hot-wire CVD

K.F. Feenstra, C.H.M. van der Werf, E.C. Molenbroek, R.E.I. Schropp

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	645-650
Number of pages	6
Journal	Materials Research Society symposia proceedings
Volume	467
Publication status	Published - 1997

Cite this

@article{de1a8dd31e51481da50c5bc4b152c3df,

title = "Deposition of device quality amorphous silicon by hot-wire CVD",

author = "K.F. Feenstra and {van der Werf}, C.H.M. and E.C. Molenbroek and R.E.I. Schropp",

year = "1997",

language = "Undefined/Unknown",

volume = "467",

pages = "645--650",

journal = "Materials Research Society symposia proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

}