Original language | Undefined/Unknown |
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Pages (from-to) | 7611-7618 |
Number of pages | 8 |
Journal | Journal of Applied Physics |
Volume | 95 |
Issue number | 12 |
Publication status | Published - 2004 |
Characterization of the plasma in a radio-frequency magnetron sputtering system
A. Palmero Acebedo, E.D. van Hattum, W.M. Arnoldbik, A.M. Vredenberg, F.H.P.M. Habraken
Research output: Contribution to journal › Article › Academic › peer-review