Characterization of the plasma in a radio-frequency magnetron sputtering system

A. Palmero Acebedo, E.D. van Hattum, W.M. Arnoldbik, A.M. Vredenberg, F.H.P.M. Habraken

Research output: Contribution to journalArticleAcademicpeer-review

Original languageUndefined/Unknown
Pages (from-to)7611-7618
Number of pages8
JournalJournal of Applied Physics
Volume95
Issue number12
Publication statusPublished - 2004

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