Characterization of the ion cathode fall region in relation to the growth of plasma sputter deposition.

A. Palmero Acebedo, E.D. van Hattum, H. Rudolph, F.H.P.M. Habraken

Research output: Contribution to journal › Meeting Abstract › Other research output

Original language	Undefined/Unknown
Journal	Tijdschrift: tijdelijk onbekend
Volume	218
Issue number	8
Publication status	Published - 2006

Cite this

@article{1dcee201c00a47bbbf261abe5b0770e0,

title = "Characterization of the ion cathode fall region in relation to the growth of plasma sputter deposition.",

author = "{Palmero Acebedo}, A. and {van Hattum}, E.D. and H. Rudolph and F.H.P.M. Habraken",

year = "2006",

language = "Undefined/Unknown",

volume = "218",

journal = "Tijdschrift: tijdelijk onbekend",

number = "8",

}