Atom lithography without laser cooling

B. Smeets; P. van der Straten; T. Meijer; C.G.C.H.M. Fabrie; K.A.H. van Leeuwen

doi:10.1007/s00340-009-3867-3

Atom lithography without laser cooling

B. Smeets
, P. van der Straten
, T. Meijer
, C.G.C.H.M. Fabrie
, K.A.H. van Leeuwen

Nanophotonics

extern

Research output: Contribution to journal › Article › Academic › peer-review

Abstract

Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.

Original language	Undefined/Unknown
Pages (from-to)	697-705
Number of pages	9
Journal	Applied Physics B: Lasers and Optics
Volume	98
Issue number	4
DOIs	https://doi.org/10.1007/s00340-009-3867-3
Publication status	Published - Mar 2010

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Cite this

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title = "Atom lithography without laser cooling",

abstract = "Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.",

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AU - van der Straten, P.

AU - Meijer, T.

AU - Fabrie, C.G.C.H.M.

AU - van Leeuwen, K.A.H.

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AB - Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.

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DO - 10.1007/s00340-009-3867-3

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