Abstract
Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
Original language | Undefined/Unknown |
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Pages (from-to) | 697-705 |
Number of pages | 9 |
Journal | Applied physics. B, lasers and optics |
Volume | 98 |
Issue number | 4 |
DOIs | |
Publication status | Published - Mar 2010 |