| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 320-329 |
| Number of pages | 10 |
| Journal | Thin Solid Films |
| Volume | 395 |
| Publication status | Published - 2001 |
Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver
Application of HWCVD Si:H films in TFTs and solar cells
- J.K. Rath
- , B. Stannowski
- , P.A.T.T. van Veenendaal
- , M.K. van Veen
- , R.E.I. Schropp
- extern
Research output: Contribution to journal › Article › Academic › peer-review