Anisotropic etching of three-dimensional shapes in silicon

H. -R. Kretschmer, X. Xia, J.J. Kelly, A. Steckenborn

Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Pages (from-to)	C633-C636
Number of pages	4
Journal	Journal of the Electrochemical Society
Volume	151
Issue number	10
DOIs	https://doi.org/10.1149/1.1790512
Publication status	Published - 2004

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@article{e331dedad89b4b30828df94582c1a616,

title = "Anisotropic etching of three-dimensional shapes in silicon",

author = "Kretschmer, {H. -R.} and X. Xia and J.J. Kelly and A. Steckenborn",

year = "2004",

doi = "10.1149/1.1790512",

language = "Undefined/Unknown",

volume = "151",

pages = "C633--C636",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Institute of Physics",

number = "10",

}