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A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography

  • R.C. Wieggers
  • , W.J. Goedheer
  • , M.R. Akdim
  • , F. Bijkerk
  • , P.A. Zegeling

Research output: Contribution to journalArticleAcademicpeer-review

Original languageUndefined/Unknown
Number of pages7
JournalJournal of Applied Physics
Volume103
Issue number1
Publication statusPublished - 2008

Keywords

  • Mathematics
  • Wiskunde en computerwetenschappen
  • Landbouwwetenschappen
  • Wiskunde: algemeen

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