A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography

R.C. Wieggers; W.J. Goedheer; M.R. Akdim; F. Bijkerk; P.A. Zegeling

A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography

R.C. Wieggers, W.J. Goedheer, M.R. Akdim, F. Bijkerk, P.A. Zegeling

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Research output: Contribution to journal › Article › Academic › peer-review

Original language	Undefined/Unknown
Number of pages	7
Journal	Journal of Applied Physics
Volume	103
Issue number	1
Publication status	Published - 2008

Keywords

Mathematics
Wiskunde en computerwetenschappen
Landbouwwetenschappen
Wiskunde: algemeen

Cite this

@article{b799888e74b247caa9e57903f0eca644,

title = "A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography",

keywords = "Mathematics, Wiskunde en computerwetenschappen, Landbouwwetenschappen, Wiskunde: algemeen",

author = "R.C. Wieggers and W.J. Goedheer and M.R. Akdim and F. Bijkerk and P.A. Zegeling",

year = "2008",

language = "Undefined/Unknown",

volume = "103",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - A particle-in-cell plus Monte Carlo study of plasma-induced damage of normal incidence collector optics used in extreme ultraviolet lithography

AU - Wieggers, R.C.

AU - Goedheer, W.J.

AU - Akdim, M.R.

AU - Bijkerk, F.

AU - Zegeling, P.A.

PY - 2008

Y1 - 2008

KW - Mathematics

KW - Wiskunde en computerwetenschappen

KW - Landbouwwetenschappen

KW - Wiskunde: algemeen

M3 - Article

SN - 0021-8979

VL - 103

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 1

ER -