µc-Si: H n-type doped layers resistant against HWCVD i-layers deposited at high temperature and high growth rate

A. Gordijn, A.L. Francke, J.K. Rath, R.E.I. Schropp

Research output: Contribution to journalArticleAcademicpeer-review

Original languageUndefined/Unknown
JournalThin Solid Films
Publication statusPublished - 2005

Cite this